Micro-nano lithography is a core process for PCB fabrication, microfluidic chips, MEMS devices and precision micro-structure mold processing. As feature linewidth continues to shrink, exposure light sources are required to deliver uniform beam, stable wavelength, consistent power and fast modulation speed. Fiber-coupled semiconductor lasers feature easy integration and flexible control, and have become preferred light sources for LDI direct imaging, dry-film lithography and SU-8 thick photoresist exposure.
The 375nm fiber coupled violet laser module is a high-performance near-UV laser source engineered for LDI laser direct imaging, maskless lithography, UV curing of polyurethane & acrylic resin, and micro-structuring processing. Adopting precision fiber coupling technology, laser outputs via flexible fiber pigtail, enabling flexible optical layout and seamless integration into various precision automatic equipment.
Photolithography is the core microfabrication technology to transfer circuit patterns onto semiconductor wafers, PCB substrates and micro-optical components, and the laser light source is the heart that determines imaging resolution, exposure uniformity and mass production yield of lithography equipment.
We will attend the 27th China International Optoelectronic Exposition (Sep 9‑11, Shenzhen World). Come and discover our new optoelectronic products & solutions. Our team is ready for technical consultation and business talks at Booth 4D045 . Welcome to visit us.
