Powerful 105um 405nm 20W UV Fiber Coupled Laser Module for Lithography Equipment

This Powerful 105um 405nm 20W Violet Fiber Coupled Laser Module is a professional-grade core component exclusively engineered for lithography equipment, integrating 405nm violet laser’s high-energy photon characteristic, 20W high-power output, and 105μm precision fiber coupling transmission. It delivers stable, focused laser energy for photoresist exposure and micro-patterning, becoming a key part in semiconductor, PCB, and microelectronic lithography systems—ensuring high-resolution, high-efficiency lithography processing.

Core Technical Advantages for Lithography Equipment

- 405nm Violet Wavelength Lithography Optimization: 405nm is the optimal wavelength for mainstream photoresists (positive/negative tone), enabling efficient photon absorption to trigger photochemical reactions. The 405nm 20W fiber coupled laser supports sub-micron level resolution in lithography processing, outperforming longer wavelengths in fine pattern rendering—critical for semiconductor chiplet and high-density PCB circuit manufacturing.

- 20W High Power for Fast Exposure: With stable CW output, the 20W high power accelerates photoresist exposure speed by 40% compared to 10W modules. It shortens exposure time per unit area to ≤50ms/cm², meeting high-throughput requirements of mass-produced lithography equipment while ensuring uniform energy distribution.

- 105μm Fiber Coupling Precision Transmission: Equipped with 105μm core diameter silica fiber (numerical aperture NA=0.22, coupling efficiency ≥85%), it transmits laser energy with minimal loss. The fiber’s small core ensures a focused beam spot for precise photoresist patterning, and its flexibility allows alignment with lithography equipment’s optical path—reaching narrow or complex exposure areas.

- Lithography-Grade Stability & Reliability: Adopts high-power semiconductor laser array and active cooling system (water cooling + heat sink), maintaining stable operation at 20℃-25℃ (lithography process temperature). It supports 24/7 continuous exposure (service life >1,000 hours) with power drift ≤0.5%/1000 hours—avoiding lithography pattern distortion caused by power fluctuations.